ECE_138L_W11_Syllabus

ECE_138L_W11_Syllabus - Exp 7 Chromium Coating Argon...

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ECE 138L Schedule (W2011) 1/03 - 1/07 Lecture: General introduction, spin-coating, photolithography Exp: 1, Simple Photomask Design Using AutoCAD; Cleanroom Orientation 1/10 - 1/14 Lecture: Thin film deposition Exp: 2, Wafer Cleaning and Aluminum Evaporation 1/17 - 1/21 Lecture: Oxidation & Etching Exp: 3, Photoresist Application, Exposure and Al Etching 1/23 – 1/28 Lecture: Anisotropic Etching Exp: 4, Wet and Dry Oxidation of Si 1/31 – 2/04 Lecture: Scanning Electron Microscopy Exp: 4. Photolithography and SiO 2 Wet Etching 2/07 – 2/11 Lecture: E-beam Lithography Exp: 5. Silicon Microstructuring – Isotropic and Anisotropic Wet Etching
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Unformatted text preview: Exp: 7. Chromium Coating - Argon Sputtering; Scanning Electron Microscopy (SEM) and Environmental Scanning Electron Microscopy (ESEM) (Demo) 2/14 – 2/18 Lecture: Microfluidic device (1) Exp: 6. Electron Beam Lithography (Demo) 2/20- 2/25 Lecture: Microfluidic device (2) Exp: 8, Fabrication of Microchannel Mold Master Using SU 8 – 25 photoresist 2/28 – 3/04 Lecture: Nano-imprinting Lithography (NIL) Exp: 9&10, Molding of Deep Polydimethylsiloxizane (PMDS) Microstructures; PDMS Bonding 3/7 – 3/11 Lecture: Self-assembly Individual meeting with DW/WC on final paper writing (appointment)...
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This note was uploaded on 12/11/2011 for the course CIS 92 taught by Professor Taylor-harper during the Fall '11 term at DeAnza College.

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