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154_syllabus - ray photoelectron spectroscopy and etc...

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Fall 2011 OEM154: Nanophotonic Materials Analysis Instructor: Dr. Lee Chow and Dr. Gwo-mei Wu Graduate Institute of Electro-Optics Chang Gung University Office: Engineering Building 10 floor Email: [email protected] or [email protected] Lecture hour: Thursday 2:10-5:00pm, Room: C0207 Office hour: Thursday 5:10 – 6:00 pm, Room, E10xx Course objective : The objective of this interdisciplinary course is to introduce to the students the science and technology of modern analytical techniques applied to nanoscale photonic materials. We will concentrate on two major topics in this course i.e. (a) The fundamental physical principles of modern materials analysis, (b) Modern techniques that are used to investigate photonic materials, including Rutherford backscattering, proton induced X-ray emission, ion channeling, secondary ion mass spectroscopy, electron energy loss spectroscopy, Auger electron spectroscopy, X-ray diffraction, extended X-ray fine absorption spectroscopy, X-
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Unformatted text preview: ray photoelectron spectroscopy, and etc. Prerequisites: Graduate students in Engineering College of Chang Gung University. Credit hour 3(3,0) Text and references Textbook: none. Reference books (subject to change) (1) “Fundamentals of Nanoscale Film Analysis”, by Terry L. Alford, Leonard C. Feldman, James W. Mayer, Springer, (2007). (2) “Material Science with Ion Beam”, By Harry Bernas, Springer (2009). (3) “Fundamental of surface and thin field analysis”, by L. C. Feldman and J. W. Mayer. Elsevier (1986). (4) “Backscattering Spectroscopy”, By W. K. Chu, J W mayer, and M. A. Nicolet, Academic Press (1978). Course outlines: TBA Grading Homework Assignment 25% Mid term 25% Final 35% In class Quiz 15% Important dates: Mid term Nov. 10, 2011 Final January 12, 2012 Disclaimer: Instructor reserves the right to modify the syllabus to meet the objectives of the course....
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154_syllabus - ray photoelectron spectroscopy and etc...

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