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DOE_ Excel_Demo 3-8-09

# DOE_ Excel_Demo 3-8-09 - 10.78 1.826667 1.766667 1.796667...

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A B C D E F ChE 132C WOg 3 DEMONSTRATION OF DOE USING EXCEL: 4 Exercise 14-15: Surface charge on a silicon wafer ~ 6 Factor A: Cleaning method (SD or SRD) Factor B: Wafer position for measurement (left or right) Output: Surface charge ( measurements in table) 10 L R SD 1.66 1.84 1.9 1.84 1.92 1.62 SRD -4.2 -7.58 -1.4 -2.2 16 -2.1 -5.36 - ~N-(JV A: T-WO-Factor wiffi Replication 18 r---- 19 (Choose from Tools/Data Analysis menu in Excel) I--- ~ I I I 1- 21 Data Entry: Note that the array includes the labels.

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Results for Exercise 14-15 Anova: Two-Factor With Replication SUMMARY L R Total 3
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Unformatted text preview: 10.78 1.826667 1.766667 1.796667 0.020933 0.016133 0.015907 3 3-7.64-15.14-22.78-2.54667-5.04667-3.79667 2.208233 7.309733 5.682187 6 6-2.16-9.84-0.36-1.64 6.62948 16.8568 of Variation 55 df MS F P-value F crit 93.85613 1 93.85613 39.29076 0.000241 5.317645 4.9152 1 4.9152 2.057638 0.189356 5.317645 4.4652 1 4.4652 1.869256 0.208738 19.11007 8 2.388758 122.3466 11 method is the only factor that has a significant effect on the spark charge....
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