chex42_question_set2_s2003

chex42_question_set2_s2003 - UNIVERSITY OF CALIFORNIA SANTA...

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UNIVERSITY OF CALIFORNIA SANTA BARBARA DEPARTMENT OF CHEMICAL ENGINEERING CHE 142 and ChE 242: Microelectronics Processing Spring 2003 List of things you should know (possible quiz questions) Set # 2 1) Before oxidation (or CVD) the Si wafers are cleaned using chemicals. What cleaning steps are used and why. 2) What is CVD? What are the steps that must occur during the CVD process? 3) What is MOCVD? 4) What is meant by homogeneous process? What is meant by a heterogeneous process? Give examples of homogeneous and heterogeneous reactions in CVD. 5) Name some precursors for the chemical vapor deposition of following thin films. Write down the overall reaction. Do not bother balancing the reactions but include major reactants and products. Si, GaAs, SiO 2 , Si 3 N 4 , GaN, TiN, W, Cu. 6) What is TEOS? 7) What is the most common way of depositing polysilicon. Give the precursors, temperature, pressure range and the reactor type. What gases are added to dope polycrystalline in situ.
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