lecture_7_chex42

lecture_7_chex42 - Chemical Vapor Deposition Chemical ! A...

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Chemical Vapor Deposition Chemical Vapor Deposition ! A process wherein chemically reactive gases are used to deposit a thin film on a solid substrate ! CVD requires some sort of energy input to dissociate the precursors to form reactive intermediates that deposit on the substrate.
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Jargon of CVD: Jargon of CVD: Classification by “source of energy input” Classification by “source of energy input” (1) Thermal Chemical Vapor Deposition (CVD) heat the gas and/or the substrate (2) Plasma Enhanced Chemical Vapor Deposition (PECVD) excitation by electrons in a plasma where the electrons are accelerated by an electric field (3) Photolytic CVD excitation by light source, laser or broadband 4 3 2 0 3 2 1450 1050 2 4 , , , x H ) x ( HCl x Si H Cl SiH ) s ( ) K ( heat ) g ( ) g ( x x = + + → + 3 0 2 4 2 4 = + + + + + x e H Si e H ) x ( SiH e SiH slow ) s ( slow x plasma fast 2 2 2 2 4 2 2 2 H N SiO O N SiH ) s ( ) lamp Hg ( h + + + υ 4 2 3 3 3 4 2 CH InP H ) CH ( P ) CH ( In ) s ( h + + + 2 4 3 3 4 12
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lecture_7_chex42 - Chemical Vapor Deposition Chemical ! A...

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