ECE_220A_Matrls_215A_Homework-3_2011 - Copy

ECE_220A_Matrls_215A_Homework-3_2011 - Copy - ECE 220A/MAT...

Info iconThis preview shows page 1. Sign up to view the full content.

View Full Document Right Arrow Icon
ECE 220A/MAT 215A Homework 3 HOMEWORK 3 Evaporating a Thin Metal Film DUE: Tuesday, Nov. 8, 2011 Paper copies of the homework must be handed in class and an electronic version uploaded on Gaucho Space For this lab please use the pieces of oxidized silicon from the last homework. PLEASE MAINTAIN OWNERSHIP OF YOUR SAMPLES BEYOND THIS HOMEWORK. The first goal of this homework is to give you experience in evaporating a thin metal film onto a silicon substrate, using the lift-off technique. The second goal is to give you the opportunity to practice contact alignment. If your thin film adheres to the substrate , the third goal is for you to measure the resistance of the film you have deposited and its contact with the substrate. The final goal of the homework is to use the labs SEM to analyze your metal-oxide-semiconductor stack. 1. Prepare (clean) the pieces of silicon using the standard procedure listed in the Teaching Cleanroom. 2.
Background image of page 1
This is the end of the preview. Sign up to access the rest of the document.

This note was uploaded on 01/16/2012 for the course ECE 220a taught by Professor Staff during the Spring '08 term at UCSB.

Ask a homework question - tutors are online