Lecture12_MEMS_labIntro

Lecture12_MEMS_labIntro - Introduction to the Hands-On...

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MECE E4212 – MEMS Introduction to the Laboratories and Design Project COLUMBIA COLUMBIA Chee Wei Wong Chee Wei Wong Fall 2011 Introduction to the Hands-On Laboratories Outline: 1. Introduction to micromirror lab 2. Introduction to pressure sensor lab
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MECE E4212 – MEMS Introduction to the Laboratories and Design Project COLUMBIA COLUMBIA Chee Wei Wong Chee Wei Wong Fall 2011 Electrostatic Micromirror Test Laboratory Ex.: Optically flat Si micromirror (NJIT)
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MECE E4212 – MEMS Introduction to the Laboratories and Design Project COLUMBIA COLUMBIA Chee Wei Wong Chee Wei Wong Fall 2011 Fabrication Process (1) (2) (3) (4) Reflective metal coating Photoresist Silicon wafer Silicon Dioxide Second wafer, fusion bonded
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MECE E4212 – MEMS Introduction to the Laboratories and Design Project COLUMBIA COLUMBIA Chee Wei Wong Chee Wei Wong Fall 2011 Fabrication Process (2) Advantages of wafer bonding/DRIE Greater unity of properties Less stress within the structures Robust, non-deformed reflective surface Prevent stiction Thinner layers of silicon possible High aspect ratio
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MECE E4212 – MEMS Introduction to the Laboratories and Design Project COLUMBIA COLUMBIA Chee Wei Wong Chee Wei Wong Fall 2011 Experimental Set Up
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MECE E4212 – MEMS Introduction to the Laboratories and Design Project COLUMBIA COLUMBIA Chee Wei Wong Chee Wei Wong Fall 2011 Static Characterization Snapdown voltage – Average of 61.2V Deflection angle – Average of 0.916° Averaged Voltage vs. Deflection Angle 0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1 0 10 20 31.267 35 40 45 50 55 57.5 60 61.167 Voltage (V) Deflection Angle (degree)
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MECE E4212 – MEMS Introduction to the Laboratories and Design Project COLUMBIA COLUMBIA Chee Wei Wong Chee Wei Wong Fall 2011 Dynamic Characterization Approach: - Apply alternating voltage, - sweep the frequency, - measure amplitude of motion Results: Curve fitting of typical response of second-order system to define the parameters: Damping ratio ξ = 0.54761 Quality factor Q = 1/2 ξ = 1.8261 Natural frequency f = 3471Hz 0 2000 4000 6000 8000 10000 0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1.0 1.1 1.2 Data: Data1_G Model: second Chi^2 = 0.00764 R^2 = 0.83728 P1 0.54761 ±0.02644 P2 3470.62189 ±180.11202 Normalized ampilitude Frequency(Hz)
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MECE E4212 – MEMS Introduction to the Laboratories and Design Project COLUMBIA COLUMBIA Chee Wei Wong Chee Wei Wong Fall 2011 Peizoresistive Pressure Sensor Test Laboratory Why Use MEMS Pressure Sensors? •S m a l l s i z e • Relative chemical resistance • Rigorous mechanical properties of silicon • Low-cost sensor fabrication opportunity • Mature processing technology
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MECE E4212 – MEMS Introduction to the Laboratories and Design Project COLUMBIA COLUMBIA Chee Wei Wong Chee Wei Wong Fall 2011 Industries/applications Household appliances 1. Washing machines 2. Dish washers 3. Vacuum cleaners Automotive 1. Oil level 2. Gas level 3. Air pressure detection Biomedical applications 1. Blood pressure 2. respiratory monitors 3. neonatal monitors 4. pressure in leg prosthesis
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MECE E4212 – MEMS Introduction to the Laboratories and Design Project COLUMBIA COLUMBIA Chee Wei Wong Chee Wei Wong Fall 2011
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Lecture12_MEMS_labIntro - Introduction to the Hands-On...

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