143f2010-01-soln

143f2010-01-soln - 1 N.CHEUNG EE143, Fall 2010 Homework...

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1 N.CHEUNG EE143, Fall 2010 Homework Assignment # 1 Solutions Problem 1 Processing Terminologies (a) “Growing” an oxide layer : Thermal oxidation is used to form SiO 2 by reacting the Si substrate atoms with oxygen or steam. Si substrate atoms will be consumed using this process. “Depositing” an oxide : The SiO 2 material is deposited from external sources (e.g. by chemical vapor deposition or sputtering deposition methods). No Si substrate atoms will be consumed to form the SiO2. (b) (i) What is a photomask? The glass plate with chromium patterns used in optical lithography. Chrome regions will block out the light and will not expose the photoresist. (ii) What is an etching mask ? Quote one example. Patterns of materials on the wafer which protects the regions underneath from being etched. Example: photoresist patterns on an oxide layer. (iii) What is an oxidation mask? Quote one example. Patterns of materials on the wafer which protects the regions underneath from being oxidized during a thermal oxidation step. Example: Si 3 N 4 patterns on top of Si wafer
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2 (iv) What is an implantation mask? Quote one example.
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143f2010-01-soln - 1 N.CHEUNG EE143, Fall 2010 Homework...

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