143f2010-02 - EE143, Fall 2010 Homework Assignment # 2 (Due...

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EE143, Fall 2010 Homework Assignment # 2 (Due Sept 17, Friday 9am) Reading Assignment Jaeger, Chap 2 EE143 Lecture Notes Problem 1 How to choose a stepper An established optical lithography process using G-line illumination ( = 436 nm) can produce a minimum printable feature (= k   /NA) of 0.5 m with a Depth of Focus (= /2(NA) 2 ) of 1 m. A new IC product requires a minimum printable feature of 0.3 m with a Depth of Focus = 0.4 m. Two optical steppers are available with the following specifications: NA Stepper A 365 nm (I-line) 0.6 Stepper B 248 nm (excimer laser) 0.5 Assuming the technology factor k for minimum feature remains the same, which stepper will meet both the minimum feature and DOF requirements? Show calculations to justify your choice. Problem 2 Thermal expansion of glass mask and Si The linear expansion coefficient of glass mask plate is 9 10 -6 /ーC and that of Si is 2.3 10 -6 /ーC. The maximum allowable error due to thermal run in/out is ア0.5 m across a 100mm diameter Si wafer.
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This note was uploaded on 03/03/2012 for the course EECS 142 taught by Professor Ee142 during the Spring '04 term at University of California, Berkeley.

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143f2010-02 - EE143, Fall 2010 Homework Assignment # 2 (Due...

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