Lec_04

Info icon This preview shows pages 1–8. Sign up to view the full content.

View Full Document Right Arrow Icon
Professor N. Cheung, U.C. Berkeley Lecture 4 EE143 F2010 1 Photolithography Minimum Feature Resolution Depth of Focus Overlay Errors Photoresist Response E-beam and EUV lithography Key Topics: Photo = s = (through) light Litho = s = stone Graphy = = writing
Image of page 1

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full Document Right Arrow Icon
Professor N. Cheung, U.C. Berkeley Lecture 4 EE143 F2010 2 •Slow • several nm resolution •High throughput
Image of page 2
Professor N. Cheung, U.C. Berkeley Lecture 4 EE143 F2010 3
Image of page 3

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full Document Right Arrow Icon
Professor N. Cheung, U.C. Berkeley Lecture 4 EE143 F2010 4 Contact Printing wafer hv photoresist Resolution R < 0.5 m mask plate is easily damaged or accumulates defects Photo Mask Plate
Image of page 4
Professor N. Cheung, U.C. Berkeley Lecture 4 EE143 F2010 5 Proximity Printing wafer hv g~20 m exposed Photoresist x R = k ( g ) 1/2 ~ 1 m for visible photons, much smaller for X-ray lithography
Image of page 5

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full Document Right Arrow Icon
Professor N. Cheung, U.C. Berkeley Lecture 4 EE143 F2010 6 Projection Printing hv lens wafer P.R. focal plane ~0.2 m resolution (deep UV photons) tradeoff: optics complicated and expensive De-Magnification: nX 10X stepper 4X stepper 1X stepper
Image of page 6
Professor N. Cheung, U.C. Berkeley Lecture 4
Image of page 7

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full Document Right Arrow Icon
Image of page 8
This is the end of the preview. Sign up to access the rest of the document.

{[ snackBarMessage ]}

What students are saying

  • Left Quote Icon

    As a current student on this bumpy collegiate pathway, I stumbled upon Course Hero, where I can find study resources for nearly all my courses, get online help from tutors 24/7, and even share my old projects, papers, and lecture notes with other students.

    Student Picture

    Kiran Temple University Fox School of Business ‘17, Course Hero Intern

  • Left Quote Icon

    I cannot even describe how much Course Hero helped me this summer. It’s truly become something I can always rely on and help me. In the end, I was not only able to survive summer classes, but I was able to thrive thanks to Course Hero.

    Student Picture

    Dana University of Pennsylvania ‘17, Course Hero Intern

  • Left Quote Icon

    The ability to access any university’s resources through Course Hero proved invaluable in my case. I was behind on Tulane coursework and actually used UCLA’s materials to help me move forward and get everything together on time.

    Student Picture

    Jill Tulane University ‘16, Course Hero Intern