Lec_13 - Professor N Cheung, U.C. Berkeley Lecture 13 EE143...

Info iconThis preview shows pages 1–9. Sign up to view the full content.

View Full Document Right Arrow Icon
Professor N Cheung, U.C. Berkeley Lecture 13 EE143 F2010 1 Chemical Vapor Deposition (CVD) film substrate chemical reaction source More conformal deposition vs. PVD step t t ( higher temp has higher surface diffusion) Shown here is 100% conformal deposition
Background image of page 1

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full DocumentRight Arrow Icon
Professor N Cheung, U.C. Berkeley Lecture 13 EE143 F2010 2     Z Y X O H C SiO H OC Si ate orthosilic ene tetraethyl TEOS c H SiO O SiH H O P O PH SiO O P glass silicate phospho PSG b H SiO O SiH SiO a 2 4 5 2 2 2 2 4 2 5 2 2 2 5 2 2 2 2 4 2 . : ) ( 2 6 2 5 3 4 . : ) ( 2 ) ( gas 350 o C-500 o C solid 350 o C-500 o C gas LPCVD Examples
Background image of page 2
Professor N Cheung, U.C. Berkeley Lecture 13 EE143 F2010 3   HF W H WF W f H Si SiH Si Poly e H N Si NH SiH N Si d C o 6 3 ) ( 2 ) ( 12 3 ) ( 2 6 2 600 4 2 4 3 3 4 4 3
Background image of page 3

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full DocumentRight Arrow Icon
Professor N Cheung, U.C. Berkeley Lecture 13 EE143 F2010 4 CVD Reactors
Background image of page 4
Professor N Cheung, U.C. Berkeley Lecture 13 EE143 F2010 5 CVD Mechanisms reactant 1 2 5 4 3 stagnant gas layer surface diffusion substrate 1 = Diffusion of reactant to surface 2 = Absorption of reactant to surface 3 = Chemical reaction 4 = Desorption of gas by-products 5 = Outdiffusion of by-product gas
Background image of page 5

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full DocumentRight Arrow Icon
Professor N Cheung, U.C. Berkeley Lecture 13 EE143 F2010 6 Example: Poly-Si Deposition
Background image of page 6
Professor N Cheung, U.C. Berkeley Lecture 13 EE143 F2010 Flux across boundary Flux used in reaction Normalize to total pressure Thickness growth velocity ) C C ( h F S G G 1 S S 2 C k F ... P P P C C Y 2 _ GAS 1 _ GAS GAS SPECIES _ ALL GAS N F v CVD Growth Rate Model N = atomic density of film 7
Background image of page 7

Info iconThis preview has intentionally blurred sections. Sign up to view the full version.

View Full DocumentRight Arrow Icon
Professor N Cheung, U.C. Berkeley Lecture 13 EE143 F2010 Diffusion Constant in Gas Proof : F = n 1 v 4 - n 2 v 4 = v 4 (   dn dx ) where = mean free path of gas collision.
Background image of page 8
Image of page 9
This is the end of the preview. Sign up to access the rest of the document.

Page1 / 30

Lec_13 - Professor N Cheung, U.C. Berkeley Lecture 13 EE143...

This preview shows document pages 1 - 9. Sign up to view the full document.

View Full Document Right Arrow Icon
Ask a homework question - tutors are online