Lec_18 - EE143 F2010 Lecture 18 IC Process Integration...

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Professor N Cheung, U.C. Berkeley Lecture 18 EE143 F2010 1 IC Process Integration Example IC Process Flows Simple resistor NMOS - Generic NMOS Process Flow CMOS - Generic CMOS Process Flow Self-aligned Techniques LOCOS- self-aligned channel stop Self-aligned Source/Drain Lightly Doped Drain (LDD) Self-aligned silicide (SALICIDE) Self-aligned oxide gap Advance MOS Techniques Twin Well CMOS , Retrograde Wells , SOI CMOS
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Professor N Cheung, U.C. Berkeley Lecture 18 EE143 F2010 2 Self-aligned channel stop with Local Oxidation (LOCOS) Si 3 N 4 CVD pad oxide Si LOCOS Process Flow
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