MacDiarmid - Grain Growth Kinetics of ZnOAl Nanocrystalline Powders

We thank justin kimpton powder diraction beamline

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Unformatted text preview: f the generalized parabolic grain growth and the relaxation model for large values of D∞. This material is available free of charge via the Internet at http://pubs.acs.org. ARTICLE (23) Han, J.; Mantas, P. Q.; Senos, A. M. R. J. Mater. Res. 2001, 16, 2850. (24) Nasr, B.; Dasgupta, S.; Wang, D.; Mechau, N.; Kruk, R.; Hahn, H. J. Appl. Phys. 2010, 108, 103721. ’ AUTHOR INFORMATION Corresponding Author *E-mail: b.ingham@irl.cri.nz. ’ ACKNOWLEDGMENT Portions of this research were undertaken on the Powder Diffraction beamline at the Australian Synchrotron, Victoria, Australia. The views expressed herein are those of the authors and are not necessarily those of the owner or operator of the Australian Synchrotron. We thank Justin Kimpton (Powder Diffraction beamline, Australian Synchrotron) for technical assistance. We acknowledge the New Zealand Foundation for Research in Science and Technology and the New Zealand Synchrotron Group for funding. ’ REFERENCES (1) In Transparent Conductive Zinc Oxide; Ellmer, K., Klein, A., Rech, B., Eds.; Springer Series in Materials Science 104; Springer-Verlag: Berlin, 2008. (2) Znaidi, L. Mater. Sci. Eng. B 2010, 174, 18. (3) Wang, H.; Xu, M.-H.; Xu, J.-W.; Ren, M.-F.; Yang, L. J. Mater. Sci.: Mater. Electron. 2010, 21, 589. (4) Alam, M. J.; Cameron, D. C. J. Vac. Sci. Technol. A 2001, 19, 1642. (5) Lee, S.-Y.; Park, B.-O. Thin Solid Films 2003, 426, 94. (6) Mamat, M. H.; Sahdan, M. Z.; Khusaimi, Z.; Zain Ahmed, A.; Abdullah, S.; Rusop, M. Opt. Mater. 2010, 32, 696. (7) Lin, K.-M.; Tsai, P. Thin Solid Films 2007, 515, 8601. (8) Bahs i, Z. B.; Aslan, M. H.; Ozer, M.; Oral, A. Y. Cryst. Res. Technol. 2009, 44, 961. (9) Serier, H.; Gaudon, M.; Mntrier, M. Solid State Sci. 2009, ee 11, 1192. (10) Tsubota, T.; Ohtaki, M.; Eguchi, K.; Arai, H. J. Mater. Chem. 1997, 7 (1), 85. (11) Kemmitt, T.; Ingham, B.; Linklater, R. J. Phys. Chem. C 2011, 115, 15031. (12) Chen, K. J.; Fang, T. H.; Hung, F. Y.; Ji, L. W.; Chang, S. J.; Young, S. J.; Hsiao, Y. J. Appl. Surf. Sci. 2008, 254, 5791. (13) Natter, H.; Schmelzer, M.; L€ffler, M. S.; Krill, C. E.; Fitch, A.; o Hempelmann, R. J. Phys. Chem. B 2000, 104, 2467. (14) Yevtushenko, O.; Natter, H.; Hempelmann, R. Thin Solid Films 2006, 515, 353. (15) Lai, J. K. L.; Shek, C. H.; Lim, G. M. Scripta Mater. 2003, 49, 441. (16) Shek, C. H.; Lai, J. K. L.; Lim, G. M. Nanostruct. Mater. 1999, 11, 887. (17) Hynes, P.; Doremus, R. H.; Siegel, R. W. J. Am. Ceram. Soc. 2002, 85, 1979. (18) Shukla, S.; Seal, S.; Vij, R.; Bandyopadhyay, S. Nano Lett. 2003, 3, 397. (19) Kuo, C. W.; Shen, Y. H.; Hung, I. M.; Wen, S. B.; Lee, H. E.; Wang, M. C. J. Alloys Compd. 2008, 472, 186–193. (20) Zhou, X. D.; Huebner, W. Appl. Phys. Lett. 2001, 79, 3512. (21) Chu, M. T.; Rahaman, M. N.; De Jonghe, L. C.; Brooke, R. J. J. Am. Ceram. Soc. 1991, 74, 1217. (22) Daneu, N.; Renik, A.; Bernik, S. J. Am. Ceram. Soc. 2011, c 94, 1619. 21040 dx.doi.org/10.1021/jp207140g |J. Phys. Chem. C 2011, 115, 21034–21040...
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