Lect26_notes

Fib used to micromachine micronsized posts

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Unformatted text preview: SE •  Number of SE s ~10-1000x number of SI s •  Ion beam typically 5 to 50 kV –  Zeiss instrument typically 30 kV –  Selection of kV can strongly influence quality of cut face FIB Geometry! ! ! ! ! ! ! •  Electron beam oriented vertically in our instrument •  FIB comes in at angle •  Careful alignment to ensure both beams impinge at same point on sample CBEMS 164 – XRD, SEM & Microanalysis: Lecture 26 ! 47 CBEMS 164 – XRD, SEM & Microanalysis: Lecture 26 ! 48 Material Removal and Imaging Face! ! ! ! ! ! ! •  Gallium beam removes material as it interacts with sample •  Still generates secondary electrons that are detected in usual way •  Can image clean face created by scanning ion beam 3D Reconstruction! ! ! ! ! ! ! •  As material is removed, can record series of sequential images or AVI file •  Data can be transferred to a CAD file and a magnified solid freeform fabricated model can be made CBEMS 164 – XRD, SEM & Microanalysis: Lecture 26 ! 49 CBEMS 164 – XRD, SEM &...
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This note was uploaded on 01/16/2014 for the course CBEMS 164 taught by Professor Porter,j during the Fall '08 term at UC Irvine.

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