Lithography intermediate mask 20m pr for

Info iconThis preview shows page 1. Sign up to view the full content.

View Full Document Right Arrow Icon
This is the end of the preview. Sign up to access the rest of the document.

Unformatted text preview: ess Liwei Lin, University of California at Berkeley 45 Microsystems Laboratory UC-Berkeley, ME Dept. LIGA Facility Berkeley Advanced Light Source Stanford linear accelerator CAMD – Louisiana University of Wisconsin – Madison …. Liwei Lin, University of California at Berkeley 46 Microsystems Laboratory UC-Berkeley, ME Dept. Synchrotron Radiation Beamline Liwei Lin, University of California at Berkeley 47 Microsystems Laboratory UC-Berkeley, ME Dept. Lithography – CAD & Mask CAD patterns Chrome Mask Liwei Lin, University of California at Berkeley 48 Microsystems Laboratory UC-Berkeley, ME Dept. Lithography – Intermediate Mask 20m P.R. for electroplating Gold Intermediate Mask Liwei Lin, University of California at Berkeley 49 Microsystems Laboratory UC-Berkeley, ME Dept. Thick P.R. Exposure Photon beam Scanner Liwei Lin, University of California at Berkeley 50 Microsystems Laboratory UC-Berkeley, ME Dept. Electroplating Electroplating (Nickel) Electroplated mold insert and plastic molding Liwei Lin, University of California at Berke...
View Full Document

Ask a homework question - tutors are online