4 ecen 475 6 7 414 ecen 475 p substrate sio2

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Unformatted text preview: 00000000000000000000000000000000000000000000000000000 000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000 Photoresist is a light-sensitive organic polymer Softens where exposed to light Spin on photoresist Photoresist 31.4 ECEN 475 p substrate SiO2 00000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000 900 – 1200 C with H2O or O2 in oxidation furnace Grow SiO2 on top of Si wafer Oxidation 8 61.4 ECEN 475 p substrate SiO2 Photoresist 00000 000000000000000 0000000000000000000000000000000000000000000000000000 000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000000 Only attacks oxide where resist has been exposed Etch oxide with hydrofluoric acid (HF) Etch 51.4 ECEN 475 p substrate SiO2 Photoresist 000000000000000000000000000000000000000000000000000000000000000000000...
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This document was uploaded on 03/02/2014.

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