Besuretoshowcrosssectionaland

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Unformatted text preview: his
cross
sections).
Please
find
the
critical
errors
in
this
process
 flow
 and,
 where
 possible,
 suggest
 alternate
 approaches.
 Do
 not
 worry
 about
 the
 accumulation
of
errors,
but
rather
treat
each
step
assuming
that
the
structure
up
to
 that
step
could
be
created.
 This
structure
is
actually
quite
simple
to
make.
Develop
a
simpler
process
flow
and
 associated
masks
to
create
the
final
structure.
Be
sure
to
show
cross‐sectional
and
 planar
views
of
all
key
steps
in
the
process.
 Process
steps:
 1.
Start
with
a
quartz
wafer.
 2.
PECVD
deposit
1
μm
of
polysilicon.
 3.
Perform
photolithography
using
positive
photoresist
(not
shown)
and
wet‐ etch
the
polySi
using
KOH.
 4.
Thermally
grow
1
μm
of
thermal
oxide.
 5.
Perform
photolithography
using
positive
photoresist
(not
shown)
a...
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This document was uploaded on 04/02/2014.

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