Problem 4 the following changes are possible there

This preview shows page 4 out of 4 pages.

Problem 4 The following changes are possible. There can be other acceptable changes. Rule 1 Min thin-oxide to thin-oxide spacing can be reduced because the substrate is electrically insulating SiO2. No field oxide is required for device isolation. Rule 2 Minimum underlap of contact in thin oxide can be reduced because the substrate is insulating. Misalignment of the contact hole will not create an ohmic shorting path to the buried oxide substrate. [Note: For the case of a p-type Si substrate, Al touching p-Si will create a Schottky ohmic contact.] Rule 3 Minimum metal - metal spacing can be reduced. The wafer surface topography is flatter. There is no thick LOCOS field oxide and the MOS islands can be made very thin. smaller NMOS PMOS Buried Oxide n + n + Al CVD oxide CVD oxide Buried Oxide Contact hole misalignment
Image of page 4
You've reached the end of this preview.
  • Fall '04
  • ee142
  • Aluminium, International System of Units, Min gate overlap

{[ snackBarMessage ]}

What students are saying

  • Left Quote Icon

    As a current student on this bumpy collegiate pathway, I stumbled upon Course Hero, where I can find study resources for nearly all my courses, get online help from tutors 24/7, and even share my old projects, papers, and lecture notes with other students.

    Student Picture

    Kiran Temple University Fox School of Business ‘17, Course Hero Intern

  • Left Quote Icon

    I cannot even describe how much Course Hero helped me this summer. It’s truly become something I can always rely on and help me. In the end, I was not only able to survive summer classes, but I was able to thrive thanks to Course Hero.

    Student Picture

    Dana University of Pennsylvania ‘17, Course Hero Intern

  • Left Quote Icon

    The ability to access any university’s resources through Course Hero proved invaluable in my case. I was behind on Tulane coursework and actually used UCLA’s materials to help me move forward and get everything together on time.

    Student Picture

    Jill Tulane University ‘16, Course Hero Intern