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[32] M. Kimmel, P. Rambo, R. Broyles, M. Geissel, J. Schwarz, J. Bellum, B. Atherton, “Optical dam- age testing at the Z-Backlighter Facility at Sandia National Laboratories,” Proc. SPIE 7504 , 75041G (2009). [33] N. Sanner, O. Ut´ eza, B. Bussiere, G. Coustil- lier, A. Leray, T. Itina, M. Sentis, “Measurement of femtosecond laser-induced damage and abla- tion thresholds in dielectrics,” Appl. Phys. A DOI 10.1007/s00339-009-5077-6 (2008). [34] D. Du, X. Liu, G. Korn, J. Squire, G. Mourou, “Ref a inserer,” Appl. Phys. Lett. 64 , 3071 (1994). [35] H. Varel, D. Ashkenasi, A. Rosenfeld, R. Herrmann, F. Noack, E.E.B. Campbell, “Laser-induced dam- age in SiO2 and Caf2 with picosecond and femtosec- ond laser pulses,” Appl. Phys. A 62 , 293 (1996). [36] The small differences (in the error bars) between the constants published in Ref. [8] and the present paper are due to the fact that more data that what was published in Ref. [7] are taken into account for the fit. [37] L. Gallais, J. Capoulade, J.-Y. Natoli, M. Com- mandr´ e, M.Cathelinaud, C. Koc, and M. Lequime, “Laser damage resistance of hafnia thin films de- posited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering,” Appl. Opt. 47 , C107 (2008) [38] B. J. Pond, J. I. DeBar, C. K. Carniglia, T. Raj, “Stress reduction in ion beam sputtered mixed oxide films,” Appl. Opt. 28 , 2800 (1989). [39] J.-S. Chen, S. Chao, J.-S. Kao, H. Niu, C.-H. Chen, “Mixed films of TiO2 - SiO2 deposited by dou- ble electron-beam coevaporation,” Appl. Opt. 35 , 90 (1996). [40] N. K. Sahoo, S. Thakur, R. B. Tokas, “Achieving superior band gap, refractive index and morphology in composite oxide thin film systems violating the moss rule,” J. Phys. D 39 , 2571 (2006). [41] C.-C. Lee, C.-J. Tang, J.-Y. Wu, “Rugate filter made with composite thin films by ion-beam sput- tering,” Appl. Opt. 45 , 1333 (2006). [42] O. Stenzel, S. Wilbrandt, M. Schurmann, N. Kaiser, H. Ehlers, M. Mende, D. Ristau, S. Bruns, M. Ver- gohl, M. Stolze, M. Held, H. Niederwald, T. Koch, W. Riggers, P. Burdack, G. Mark, R. Schafer, S. Mewes, M. Bischoff, M. Arntzen, F. Eisenkramer, M. Lappschies, S. Jakobs, S. Koch, B. Baumgarten, A. Tunnermann, “Mixed oxide coatings for optics,” Appl. Opt. 50 , C69 (2011) [43] D. Nguyen, L. A. Emmert, I. V. Cravetchi, M. Mero, W. Rudolph, M. Jupe, M. Lappschies, K. Starke, D. Ristau, “Ti x Si 1 x O 2 optical coatings with tun- able index and their response to intense subpicosec- ond laser pulse irradiation,” Appl. Phys. Lett. 93 , 261903 (2008). [44] N. Bloembergen, “Laser-induced electric breakdown in solids,” IEEE Journal of Quantum Electronics 10 , 375 (1974). [45] M. Jup´ e, M. Mende, C. Kolleck, D. Ristau, L. Gal- lais, and B. Mangote, “Measurement and calcula- tion of ternary oxide mixtures for thin films for ultra short pulse laser optics,” Proc. SPIE 8190 , 819004 (2011)
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11 Table 1. Summary of results for the surface of bulk materials. LIDT values are given at 500fs, 1030nm, single pulse irradiation (see text for details). The optical bandgap values indicated with ’*’ have been extracted from references. Other bandgap values have beeen measured.
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