E .151 K (1 my 4mm; 251:1 1
Humemrk Nu. 'F cfw_wiLh mlutiuus]
Emblem 1. [41H] and 1-" hr. mdnpmhimLEtaJuiEJ-d uni-ma] ramlum mlahlm, and .Pa' = H+ F, F = H 21."-
Find EDIT I Fl. uni-cfw_XE. and the joint probability density fIIEGLim'I nf JI. and 1".
Salut
Manuel Lopez
09/13/2016
Lab Section: Tuesday 5-8pm
FabLab Post Lab 2
The goal of this lab was to do a standard cleaning on our samples, spin coat them with the
photoresist (PR), prebake them, apply the pattern mask through UV light, do the develop pattern
Manuel Lopez
09/06/2016
Lab Section: Tuesday 5-8pm
FabLab Post Lab 1
The goal of this lab was to mark our devices and materials to be tested and measure their thickness
using the Filmetrics system. At the beginning of the lab we receive our n-type and p-t
Manuel Lopez
09/20/2016
Lab Section: Tuesday 5-8pm
FabLab Post Lab 3
The goal for this lab was to protect the back side of our samples field oxide with photoresist and
realize wet etch to prepare them for doping. The reason why we added PR to the back sid
Manuel Lopez
09/27/2016
Lab Section: Tuesday 5-8pm
FabLab Pre-Lab 4
In the next lab we will be doping our samples through a two-step, high temperature process.
From last weeks lab we now have openings to the silicon wafer where will be doing our doping.
F
Manuel Lopez
09/20/2016
Lab Section: Tuesday 5-8pm
FabLab Pre-Lab 3
In the next lab we will be adding field oxide to the backside of our substrates to protect them and
do wet etch to our samples.
The material that will be using to do wet etch is called hy
Pre Lab 9/6
Manuel Lopez
The prelab material for this week includes wafer cleaning and filmetrics.
This week we will go through standard clean of silicon samples which is one of the most important and
difficult steps in silicon integrated circuit processi
Manuel Lopez
9/13/2016
Lab Section: Tuesday 5-8pm
FabLab Pre Lab 2
In this next lab we will be doing some photolithography process.
Photolithography is use to form patterns on the surface of a circuit substrate; it uses a thin
photosensitive organic film,
Manuel Lopez
10/04/2016
Lab Section: Tuesday 5-8pm
FabLab Pre Lab 5
In this next lab we will be doing the second mask through the photolithography process. The
first thing to do will be to do a standard cleaning by sinking our samples in acetone, then in
DESIGN PATTERNS
Meiru Che
EE461L
Figures from Head First Design Patterns
2
Announcements
Midterm exam 1: Thursday, March 9
In class
75 minutes
Homework 2
Due March 24
Project progress presentation
Due March 27 submit presentation file
Present on M
EE 351K (16440)Spring 2017
1
Homework No. 8 (Due on 4/18/17)
Problem 1. At a computer disk drive factory, inspectors randomly pick a product from production lines to
detect a failure. If the production lines are normal, this failure rate q0 = 104 . Howeve
26
The Faade Pattern
A special kind of adapter
AW]^MLWVMaW]ZZM[MIZKPIVLaW]^MI[MUJTMLISQTTMZ[a[\MU
KWUXTM\M_Q\PI,>,XTIaMZIXZWRMK\QWV^QLMW[a[\MUIV
I]\WUI\ML[KZMMV[]ZZW]VL[W]VLIVLM^MVIXWXKWZVXWXXMZ
27
+PMKSW]\ITT\PMKWUXWVMV\[aW]^MX]\WOM\PMZ"
A Home Theater
$
EE 351K (16440)Spring 2017
1
Homework No. 7 (Due on 4/4/17)
Problem 1. Let X be a nonnegative random variable whose moment generating function MX (s) = E esX
is finite for all s and let be a positive number. By arguing as in the proof of Chebyshevs inequa
DESIGN PATTERNS II
Meiru Che
EE461L
Figures from Head First Design Patterns
2
The Observer Pattern
3
A Weather Monitoring Application
Create an app that uses the WeatherData object to update three different displays:
current conditions
weather stats
fo
DESIGN PATTERNS I
Meiru Che
Figures from Head First Design Patterns
2
Pattern in Design
A solution to a problem in a context.
A language for communicating solutions with others
Pattern languages exist for many problems, but we focus on design
Best kno
16
The First Pattern
17
Announcements
Homework 1 is due this Friday, midnight
Project proposal report, presentation file
Due by next Monday, midnight
Proposal presentation next week
Sign up for a slot
8 minutes
No tutorial for next week
Use lab ti
INFORMATION HIDING
Meiru Che
Slides based on materials from Christine Julien, Miryung Kim and
Jonathan Aldrich
2
A Programmers Approach to Software Engineering
Skip requirements engineering and design phases
just start coding
Why?
3
Software Design Over
DESIGN PATTERNS
Meiru Che
EE461L
Figures from Head First Design Patterns
2
The Singleton Pattern
3
Announcements
Homework 2 has been assigned
Due in 4 weeks, March 24
Tutorial 6 due this coming Sunday
Midterm exam 1
Next Thursday, March 9
In class
EE 351K (16440)Spring 2017
1
Homework No. 3 (Due on 02/16/17)
Problem 1. Suppose Y = (3X 2)2 , and E[X] = 2, var(X) = 5. Find E[Y ].
Problem 2. A die is rolled 4 times. Let X and Y be the number of appearances of 1 and 6 respectively.
Find the joint proba
EE351K - Probability and Random Processes
Prof. Sriram Vishwanath
Homework #5 Solution
Due: Tuesday Mar. 3, In Class
1. (10 pts) Let f and g be valid probability density functions. Define a new function
h(x) = f (x) + (1 )g(x),
where 0 1. Show that h is a
EE351K - Probability and Random Processes
Prof. Sriram Vishwanath
Homework #6 Solution
Due: Tuesday Mar. 10, In Class
1. (10 pts) Let X have a distribution function, FX (x) =
0
1
4x
1
if x < 0
if 0 x 4
if x > 4
Let Y = X 2 . Find,
(a) P (1 X 2)
Ans. P (1
EE351K - Probability and Random Processes
Prof. Sriram Vishwanath
Homework #4 Solution
Due: Tuesday Feb. 24, In Class
1. (10 pts) On a certain day there are N workers trimming a field. N is equally likely to be one of
1, 2, 3, 4, 5. Let us represent the t
EE351K - Probability and Random Processes
Prof. Sriram Vishwanath
Homework #0
Due: Tuesday Jan. 27, In Class
1. (10 pts) You are a prisoner sentenced to death. The Emperor offers you a chance to live by playing
a simple game. He gives you 50 black marbles
EE 325 solution to homework 6
1. (3 points) Recall that E V , D E , and D v . Assume that v 0 , but is now not
uniform. Assume that varies with x so we have x . The divergence of the flux density
( D v ) then gives us x V 0 . Use this to find what 2V equa
EE 325
Electromagnetic
Engineering
Mikhail Belkin
Introduction
Course information
Class hours and location: Tuesday, Thursday 9:30-11 am, ART 1.120
Instructor: Prof. Mikhail Belkin; [email protected], phone (512) 471-4424 (MER)
Class home page: at Ca
TE X AS I NS TRUM E NTS - P RO DUCTION D ATA
Tiva TM4C123GH6PM Microcontroller
(identical to LM4F230H5QR)
D ATA SHE E T
D S -T M 4C 123G H6 P M - 1 5 0 3 3 . 2 6 7 2
S P M S 376B
C o p yri g h t 2 0 07-2013
Te xa s In stru me n ts In co rporated
Copyright
S T E L L A R I S E R R ATA
Stellaris LM4F230H5QR Rev A1/A3/B0 Errata
Note:
The Stellaris LM4F230H5QR microcontroller has been replaced by the identical Tiva C
Series TM4C123GH6PM microcontroller.
This document contains known errata at the time of publica
Stellaris LM4F120 LaunchPad Evaluation
Board
User s Manual
EK-LM4F1 20XL-UM-01
SMPU289
Copyrig ht 201 2 Te xas In strumen ts
Copyright
Copyright 2012 Texas Instruments, Inc. All rights reserved. Stellaris and StellarisWare are registered trademarks of Tex
EE319K Fall 2013 Exam2_BCD
First:_
Page 1
Last:_
Circle: MW12
V+Y
MW1:30
Gerst
TTh3:30
V+Y
Scoring The correct output values are shown in the figure on the right. Your grade will be based both
on the numerical results returned by your program and on your