Mechanisms for Wet Chemical Etching of Semiconductors,
insulators, and metal films
Overview Dry Etch Process
Wet Chemical Etching
Extensively used in semiconductor processing.
Starting from semiconductor wafers sliced from
Crystal Growth (contd)
Distribution of Dopants
As a crystal is pulled from the melt, the doping concentration
incorporated into the crystal (solid) is usually different from
the doping concentration of the melt (liquid) at the interfac
Lecture 3 :
The topics covered the following:
Standards and Classifications
Contamination: Types, Effects, and Sources
What is a Cleanroom?
( a )
Movement of Impurity Atoms in Crystal Lattice
Impact of Lateral Diffusion and Impurity Redistribution
Simulation of Diffusion
An introduction of controlled amount of impurity
dopants into s
The introduction covers the following:
Basic Fabrication Steps
Figure 1.1 Gross world product (GWP) and sales volume of the
electronics, automobile, semiconductor, and steel indu
Thermal Oxidation process to form SiO2.
Impurity redistribution during oxidation.
Material properties and thickness measurement techniques for SiO2.
Fig 1. Schematic cross section of a metal-oxide
Importance of clean room for lithography
Optical lithography and resolution enhancement technique
Advantages and limitations of other lithographic methods
Lithography is t
Process and Advantages of Ion Implantation
Ion Distribution and Removal of Lattice Damage
Simulation of Ion Implantation
Range of Implanted Ions
Ion Implantation is the introduction of energetic,
charged particles in