Diffusion Homework, Due Monday March 4, 2013
1. Calculate the surface concentration and junction depth for the (i) p-well, (ii) p+ source/drain, and (iii) n+ source/drain for the temperature
and time profiles given below. Calculate the diffusion coefficie
P-well
Constants Value
Unit
D_0
10.5 cm^2/s
E_A
3.69 eV
C_0
1.05E+20 cm-3
C_B
3.00E+15 cm-3
k
8.62E-05 ev/K
P-s/d
Constants Value
Unit
D_0
10.5 cm^2/s
E_A
3.69 eV
C_0
1.20E+20 cm-3
C_B
3.00E+15 cm-3
k
8.62E-05 ev/K
N-s/d
Constants Value
Unit
D_0
10.5 cm^2
Photoresist Contrast Experiment (Lithography question #6)
6. Measure the thickness of the photoresist remaining on the wafer as a function of dose. Calculate D 0, D100, and
the contrast.
2
The photoresist-coated wafer provided was exposed for 59.32 second
ChBE 4803 Lab #2 and #3: Lithography
Photolithography Laboratory Experience
Purpose: The purpose of this set of events is to:
(1) Demonstrate the spin-coating of photoresist onto a silicon wafer
(2) Analyze the spin-speed curve (thickness vs. rotation spe