Electron beam lithography (EBL)
1. Overview and resolution limit.
2. Electron source (thermionic and field emission).
3. Electron optics (electrostatic and magnetic lens).
4. Aberrations (spherical, chromatic, diffraction, astigmation).
5. EBL systems (ra
Fabrication in the nanoscale:
principles, technology and applications
Textbook: Nanofabrication: principles,
capabilities and limits, by Zheng Cui
Course instructor: Bo Cui
Office: EIT 4012 Ext. 38754
Office hour: 11-12pm, Monday & Thursday
ECE 730: Fabri
Other photon-based lithographies
Near field optical lithography
Laser beam direct writing and micro-mirror array lithography
ECE 730: Fabrication in the nanoscale: princ
Material removal: etching processes
Etching is done either in dry or wet methods:
Wet etching uses liquid etchants with wafers immersed in etchant solution.
Wet etch is cheap and simple, but hard to control (not reproducible), not popular for
Nano for p